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Itai Suez - Publications

Affiliations: 
2006 University of California, Berkeley, Berkeley, CA, United States 
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9 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2007 Rolandi M, Suez I, Scholl A, Fréchet JM. Fluorocarbon resist for high-speed scanning probe lithography. Angewandte Chemie (International Ed. in English). 46: 7477-80. PMID 17702084 DOI: 10.1002/Anie.200701496  0.709
2007 Backer SA, Suez I, Fresco ZM, Rolandi M, Fréchet JM. Covalent formation of nanoscale fullerene and dendrimer patterns. Langmuir : the Acs Journal of Surfaces and Colloids. 23: 2297-9. PMID 17269811 DOI: 10.1021/La0631973  0.694
2007 Backer SA, Suez I, Fresco ZM, Fŕchet JMJ, Conway JA, Vedantam S, Lee H, Yablonovitch E. Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1336-1339. DOI: 10.1116/1.2757184  0.722
2007 Suez I, Rolandi M, Backer SA, Scholl A, Doran A, Okawa D, Zettl A, Fréchet JMJ. High-field scanning probe lithography in hexadecane: Transitioning from field induced oxidation to solvent decomposition through surface modification Advanced Materials. 19: 3570-3573. DOI: 10.1002/Adma.200700716  0.701
2005 Suez I, Backer SA, Fréchet JM. Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell. Nano Letters. 5: 321-4. PMID 15794619 DOI: 10.1021/Nl048014G  0.743
2004 Fresco ZM, Suez I, Backer SA, Fréchet JM. AFM-induced amine deprotection: triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects. Journal of the American Chemical Society. 126: 8374-5. PMID 15237983 DOI: 10.1021/Ja047774Q  0.676
2004 Rolandi M, Suez I, Dai H, Fréchet JMJ. Dendrimer monolayers as negative and positive tone resists for scanning probe lithography Nano Letters. 4: 889-893. DOI: 10.1021/Nl049700I  0.655
2003 Fresco ZM, Bensel N, Suez I, Backer SA, Fréchet JMJ, Conley W. Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography Journal of Photopolymer Science and Technology. 16: 27-35. DOI: 10.2494/Photopolymer.16.27  0.705
2003 Fresco ZM, Bensel N, Suez I, Backer SA, Fréchet JM, Conley W. Fluorinated Chemically Amplified Dissolution Inhibitors for 157 nm Nanolithography Journal of Photopolymer Science and Technology. 16: 27-35. DOI: 10.2494/photopolymer.16.27  0.71
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